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Characterization of Pd-free electroless Co-based cap selectively deposited on Cu surface via borane-based reducing agent
2006
19 citations
Journal Article
Field-Weighted Citation Impact:
3.06
Characterization of Pd-free electroless Co-based cap selectively deposited on Cu surface via borane-based reducing agent | Researchclopedia
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Taiwan Semiconductor Manufacturing Company (Taiwan)
M.S. Liang
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Taiwan Semiconductor Manufacturing Company (Taiwan)