Formation of Cubic Boron Nitride Films by Boron Evaporation and Nitrogen Ion Beam Bombardment

1983158 citationsJournal Article

Authors

Mamoru Satou · Industrial Research Institute

Abstract

The resistivity and structure of films deposited on tantalum and rocksalt substrates by the electron beam evaporation of boron and the simultaneous bombardment of 30 keV N 2 + ion beam were studied. From observation by transmission electron microscope, it was found that cubic boron nitride was produced in the case where the prepared composition rate of boron to nitrogen was 2.5.

Topics & Keywords

Metal and Thin Film Mechanics Ion-surface interactions and analysis Diamond and Carbon-based Materials Research

UN Sustainable Development Goals

Clean water and sanitation

Publication Details

Published in: Japanese Journal of Applied Physics

Volume 22, Issue 3A, pp. L171-L171

DOI: 10.1143/jjap.22.l171

Field-Weighted Citation Impact: 11.81