Ion-assisted deposition of mixed TiO2-SiO2 films

Mixed thin films of TiO2 and SiO2 were produced by coevaporation from separate electron-beam sources and simultaneous bombardment of the growing film with oxygen ions. The optical properties of the films were determined during growth by in situ ellipsometry and the surface composition of the deposited films studied by in situ ion scattering spectroscopy, ex situ x-ray photoelectron spectroscopy, and energy filtered electron diffraction. The correlation between the optical and surface characterization is presented. There is evidence of local variations in the relative concentrations of TiO2 and SiO2. The position of the Si 2p binding energy depends on the TiO2 content in the film, indicating the possible formation of an intimate mixture.