Dose distribution of synchrotron x-ray penetrating materials of low atomic numbers

This article describes the distribution of absorption doses and spectrum shift of synchrotron x-ray traversing materials. The analytical approximations of the universal function of the synchrotron power spectrum was found. From this analytical approach, the penetration doses and the high-pass window effect were estimated for materials of low atomic numbers. The result can be generally applied to the deep x-ray lithography.