SUPERCONDUCTING PROPERTIES OF HTSC THIN FILMS PREPARED IN SITU BY SINGLE TARGET DEPOSITION

Thin films of ReBaCuO (Re=Y, Gd) and of BiCaSrCuO have been deposited onto A1 2 O 3 , MgO , SrTiO 3 , Si and ZrO 2 substrates by planar and inverted cylindrical magnetron sputtering. The main advantage of this preparation technique is the high reproducibility allowing detailed and systematic studies of the film properties as a function of deposition parameters. Optimum deposition parameters were a high oxygen partial pressure of 2×10 −1 Torr in an oxygen-argon mixture and substrate temperatures near 800°C. Except for the substrate Si the films grow highly textured on all substrates. For the 1–2–3 material zero resistance is obtained near 90 K for the case of textured growth. For Si the best film showed zero resistance near 84 K. High critical currents between 4×10 5 and 5.5×10 6 A/cm 2 were determined for films of the 1–2–3 material on the substrates MgO , ZrO 2 and SrTiO 3 . On films SrTio 3 tunnel junctions with Pb and In counterelectrodes could be prepared which showed a gap-like feature in their current-voltage characteristic. These junctions could be prepared with great reproducibility and experimental arguments could be provided which show that this gap-like feature is due to a superconducting density of states effect. Finally, first results are presented on YBaCuO thin films which were deposited by a novel ablation device which uses a pulsed electron beam instead of the laser beam.