Deep ultraviolet photodiodes based on β-Ga2O3/SiC heterojunction

A deep Ultraviolet (UV) photodiode was fabricated using a heterojunction between β-Ga2O3 with a band gap of 4.9 eV, and 6H-SiC with a band gap of 3.02 eV, and investigated its UV sensitivity. A thin β-Ga2O3 layer (200 nm) was prepared on a p-type 6H-SiC substrate through gallium evaporation in oxygen plasma. The device showed good rectifying properties. Under reverse bias, the current increased linearly with increasing deep-UV light intensity. The responsivity of the photodiode was highest to deep-UV light below a wavelength of 260 nm. The photodiode's response time to deep-UV light was in the order of milliseconds.