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Al–Cr–O thin films as an efficient hydrogen barrier

200873 citationsJournal Article

Authors

Denis Levchuk · Max Planck Institute for Plasma Physics

H. Bolt · Max Planck Institute for Plasma Physics

M. Döbeli · Oerlikon (Liechtenstein)

Simon Eggenberger · ETH Zurich

Beno Widrig · Paul Scherrer Institute

J. Ramm · ETH Zurich

Topics & Keywords

Semiconductor materials and devices Metal and Thin Film Mechanics High-Temperature Coating Behaviors

Publication Details

Published in: Surface and Coatings Technology

Volume 202, Issue 20, pp. 5043-5047

DOI: 10.1016/j.surfcoat.2008.05.012

Field-Weighted Citation Impact: 2.71

Al–Cr–O thin films as an efficient hydrogen barrier | Researchclopedia