A miniature x-ray compatible sputtering system for studying <i>i</i> <i>n</i> <i>s</i> <i>i</i> <i>t</i> <i>u</i> high <i>T</i> <i>c</i> thin film growth

We describe a miniature sputtering system incorporating an unconventional magnetron gun and a right angle sputtering geometry. The design essentially eliminates the negative ion resputtering effect encountered in the sputtering of high Tc oxide films. The geometry is compatible with the in-plane and conventional θ–2θ diffraction geometries and a chamber with two appropriate sector x-ray windows has been constructed and operated at a synchrotron. Detailed data on the performance of the sputtering gun are presented.