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The interface between silicon and a high-k oxide | Researchclopedia

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The interface between silicon and a high-k oxide

2003303 citationsJournal Articlegreen Open Access

Authors

Clemens J. Först · Clausthal University of Technology

C. Ashman · Clausthal University of Technology

Karlheinz Schwarz · TU Wien

Peter E. Blöchl · Clausthal University of Technology

Topics & Keywords

Semiconductor materials and devices Semiconductor materials and interfaces Electronic and Structural Properties of Oxides

UN Sustainable Development Goals

Industry, innovation and infrastructure

Publication Details

Published in: Nature

Volume 427, Issue 6969, pp. 53-56

DOI: 10.1038/nature02204

Field-Weighted Citation Impact: 21.18