Cubic Silsesquioxanes as a Green, High‐Performance Mold Material for Nanoimprint Lithography

201038 citationsJournal Articlebronze Open Access

Authors

Hyun Wook Ro · National Institute of Standards and Technology

Vera Popova · Mayaterials (United States)

Lei Chen · National Institute of Standards and Technology

Aaron M. Forster · National Institute of Standards and Technology

Yifu Ding · National Institute of Standards and Technology

Kyle J. Alvine · National Institute of Standards and Technology

Dave J. Krug

Abstract

One-step direct nanoimprinting into cubic-silsesquioxane (SSQ) films create low surface energy, high-modulus, thermally stable, and UV-transparent patterns that can then be used as secondary molds for both thermal and UV versions of nanoimprinting. The optimization of these materials is demonstrated by varying the microstructure of the initial SSQ material. The pattern fidelity for features as small as 10 nm is quantified using X-ray reflectivity and AFM.

Topics & Keywords

Nanofabrication and Lithography Techniques Advancements in Photolithography Techniques Metal and Thin Film Mechanics

UN Sustainable Development Goals

Affordable and clean energy

Publication Details

Published in: Advanced Materials

Volume 23, Issue 3, pp. 414-420

DOI: 10.1002/adma.201001761

Field-Weighted Citation Impact: 3.46