Chemical Mechanical Planarization of Microelectronic Materials

1997805 citationsBook

Authors

Abstract

Historical perspective CMP: variables and manipulations electrochemical and mechanical concepts for CMP processes copper CMP CMP of other materials post CMP cleaning.

Topics & Keywords

Advanced Surface Polishing Techniques Advanced Machining and Optimization Techniques Advanced machining processes and optimization

Publication Details

DOI: 10.1002/9783527617746

Field-Weighted Citation Impact: 8.87

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Chemical Mechanical Planarization of Microelectronic Materials

Authors

Abstract

Topics & Keywords

Publication Details