Layout impact of resolution enhancement techniques

2003114 citationsJournal Article

Authors

Abstract

This tutorial introduces the reader to the basic concepts of optical lithography, derives fundamental resolution limits, reviews the challenges facing future technology nodes, explains the principles of resolution enhancement techniques and their impact on chip layout, and discusses layout optimization considerations.

Topics & Keywords

Advancements in Photolithography Techniques Nanofabrication and Lithography Techniques Integrated Circuits and Semiconductor Failure Analysis

UN Sustainable Development Goals

Quality Education

Publication Details

DOI: 10.1145/640000.640026

Field-Weighted Citation Impact: 9.88