Silicon-nitride Films Deposited by PECVD Method on Silicon Substrate for Next Generation Laser Interference Gravitational Wave Detector

20163 citationsJournal Article

Authors

S. Chao · National Tsing Hua University

Huang-Wei Pan · National Tsing Hua University

Ling-Chi Kuo · National Tsing Hua University

Shuyu Huang · National Tsing Hua University

Mengyun Wu · National Tsing Hua University

Y. J. Juang · National Tsing Hua University

Chia‐Wei Lee ·

Abstract

We show optical properties and stress related mechanical loss for silicon nitride films deposited by plasma enhanced chemical vapor deposition (PECVD) method for application in the next generation laser interference gravitational wave detector.

Topics & Keywords

Advanced Fiber Optic Sensors Advanced Fiber Laser Technologies Mechanical and Optical Resonators

Publication Details

DOI: 10.1364/oic.2016.mb.12

Field-Weighted Citation Impact: 0.48

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Silicon-nitride Films Deposited by PECVD Method on Silicon Substrate for Next Generation Laser Interference Gravitational Wave Detector

Authors

Abstract

Topics & Keywords

Publication Details