Micro Lasers by Scalable Lithography of Metal‐Halide Perovskites

Abstract A complete lithographic scheme for thin metal halide perovskite films is demonstrated and utilized for the realization of perovskite micro lasers. The process consists of nanoimprint lithography followed by ion beam milling. It is simple, fast, scalable, and exhibits sub‐micrometer resolution. The optical properties of the perovskite films are obtained by employing analytical tools as well as by characterizing distributed feedback laser fabricated from these films. It is shown that the material properties are not impaired by the lithographic process. Using this approach, on chip, micro lasers are fabricated. The experimental characterization of these lasers shows that they exhibit low threshold levels and single‐mode lasing. As far as it is known, this is the first demonstration of complete, high‐resolution lithography of perovskites films exhibiting the smallest perovskite features realized using a top‐down lithography technique. This process offers an important tool toward integrated perovskite photonics and is highly applicable also for the fields of photovoltaics, metasurfaces, electronics, and other promising applications.