Dual Function Thin Slab Ultrafast Amplifier Producing 240W over a Range of Pulse Repetition Frequencies

Applications for ultrashort pulse (<; 100ps) laser systems are developing at an increasing rate. Broadly, the applications can be categorized as (a) low pulse repetition frequency (PRF) <; 1MHz, athermal machining with moderate pulse energies, and (b) high PRF, >1MHz highly localized (and controlled) melting with lower pulse energies. Ideally, a single technology platform should address the entire range of applications whilst providing the necessary average power to achieve productivity targets.