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We used high-power impulse magnetron sputtering (HiPIMS) to deposit tungsten carbide films for superior wear protection in abrasive environments. In order to sample different W-to-C ratios more efficiently, a combinatorial approach was chosen. A single sputter target with two equal segments was used, consisting of an upper tungsten and lower graphite segment. This allowed us to vertically sample various elemental compositions in just one deposition run without creating graphitic nano-layers by rotating the substrate holder. The substrate bias voltage, being one of the most effective process parameters in physical vapor deposition (PVD), was applied in both constant and pulsed modes (the latter synchronized to the target pulse). A direct comparison of the different modes has not been performed so far for HiPIMS W-C (separated W and C targets). The resulting coating properties were mainly analyzed by nano-hardness testing and X-ray diffraction. In general, the W2C phase prevailed in tungsten-rich coatings with pulsed bias, leading to slightly higher tungsten contents. Hardness reached maximum values of up to 35 GPa in the center region between the two segments, where a mix of W2C and WC1-x phases occurs. With pulsed bias, voltage hardnesses are slightly higher, especially for tungsten-rich films. In those cases, compressive stress was also found to be higher when compared to constant bias. Erosive wear testing by blasting with alumina grit showed that the material removal rate followed basically the coating’s hardness but surprisingly reached minimum wear loss for W2C single-phase films just before maximum hardness. In contrast to previous findings, low friction that requires higher carbon contents of at least 50 at. % is not favorable for this type of wear.