The SLX laser mask writer: advancing performance and expanding application space

Since its introduction in 2019, the SLX laser mask writer series has been a technically and commercially successful solution for mature application spaces. From the outset, Mycronic has committed to the continued development of the SLX platform, as communicated in previously published papers. These efforts have focused on enhancing performance, increasing throughput, and improving sustainability. With performance improvements, the SLX laser mask writer is increasingly capable of addressing a broader range of applications, narrowing the gap to mature e-beam technologies. By combining MPC integration with enhanced shape control for challenging features, the SLX laser mask writer can now provide superior pattern fidelity and process stability for mature node applications. This paper presents experimental results demonstrating improvements in mask accuracy and highlights the expanded application space of SLX in photomask manufacturing.