Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography

Traditional lithography processes use resist materials that require organic solvents during the development step but also often contain components derived from PFASs (per- and polyfluoroalkyl substances), raising concerns about environmental pollution and sustainability. PFASs are difficult to degrade, and their long-term effects on ecosystems and human health are the subject of international concern, making the development of alternative technologies an urgent priority. Lithography is a fundamental technology with applications beyond semiconductor manufacturing, electronics, biomedicine, and microfluidic devices. Addressing its environmental impact remains critical in both academic and industrial contexts. This study introduces a water-developable positive photoresist derived from a polymeric material incorporating plant-derived sugar chains as the resist backbone. The reactivity of the material to ultraviolet irradiation, enabled by a photoacid generator, allows microfabrication through water development. Moreover, successful micrometer-scale patterning demonstrated a superior resolution compared to previous sugar-derived water-developable resists. The dextrin-based resist exhibited the highest performance, achieving a sensitivity of 150 mJ/cm2 and a resolution of 3.6 µm under an environmentally benign, PFAS-free process that enabled development with water. These findings propose a sustainable alternative to conventional petrochemical-derived photoresists, positioning it as a promising candidate for environmentally friendly photolithography processes.