Fabrication optimization of suspended stencil mask lithography for multi-terminal Josephson junctions

Stencil mask lithography is an advanced technique for fully in situ fabricating Josephson junctions, which is increasingly being used for multiterminal Josephson junctions. This study provides information on the optimal mask design and mask reliability. For this, 270 mask designs were systematically fabricated and investigated under a scanning electron microscope. Reliable statements are made about mask yield, minimal dimensions, and systematic dependencies on the number of superconducting terminals. We find that stencil mask lithography can be used reliably for fabricating multiterminal Josephson junctions, enabling lateral mask dimensions down to 40 nm on average.