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The present book is especially focused on flowing plasmas and afterglow devices containing N2. The plasmas were produced by high-frequency (RF, microwaves) discharges at low gas pressures. The microwave plasmas with surfatron and surfaguide cavities are specifically studied. The most relevant active species in the studied flowing plasmas are the atoms and radicals coming from dissociated molecules ( N2, H2, O2, CH4). There is an interest in rare gas–molecule mixtures to obtain plasmas with high-energy electrons in He and long plasmas residence times in Ar. The N and O atom densities are obtained after NO titration and related to N2 emission spectroscopy by discussing two methods to determine the part of N+N recombination at the origin of the observed N2 radiative states. The other active species densities are obtained by the line ratio intensity method. To obtain quantitative measurements of the active species densities, it has been compared the results of NO titration for N and O – atoms to laser induced fluorescence (LIF, TALIF) for N, O and H-atoms. These last sophisticated laser method has allowed to choose the appropriate kinetic reactions in the N2-H2 and N2-CH4 flowing afterglows. The N, H, O and C-atoms, NH and CN radicals were studied for plasma chemistry and surface treatments. The nitriding of TiO2 thin films has been analysed in detail.