Direct formation of CdSe quantum dots in two-dimensional poly(vinylpyrrolidone) patterns

Abstract Quantum dots (QDs) exhibit excellent optical properties and are highly suitable for displays requiring high luminance and a wide color gamut. The development of high-resolution displays has increased interest in QD patterning techniques, including inkjet printing, transfer printing, and lithography. In this study, we demonstrate the direct fabrication of CdSe QDs within poly(vinylpyrrolidone) (PVP) patterns prepared by the lithography. In conventional lithography, QDs are exposed to electron beams, UV, or extreme UV light, which can induce structural damage. The proposed method enables QD patterning without irradiation-induced damage by synthesizing the QDs in situ after pattern formation. CdSe QDs are selectively and directly formed within the PVP patterns, and their emission wavelengths can be tuned by adjusting the synthesis temperature. The immobilization of CdSe QDs within the PVP patterns is further discussed in terms of coordination between the PVP side groups and QDs.