Real-Time Monitoring and Quantification of Fluorinated Greenhouse Gases in Semiconductor/Display Manufacturing

In this research, we propose a simple and effective method for gas analysis of semiconductor and display industries. To achieve this, residual gas analyzer (RGA) was adopted and two high-global warming potential (GWP) gases such as CF4 and NF3 commonly used in industrial application were focused. The experiment was conducted in four key steps: identifying gas species using optical emission spectroscopy (OES), calibrating RGA with a quadrupole mass spectrometer (QMS), constructing a five-point calibration graph to correlate RGA and Fourier-transform infrared spectroscopy (FT-IR) data, and estimating the concentration of unknown samples using the calibration graph. The results under plasma-on conditions demonstrated correlation and accuracy, confirming the reliability of our approach. In other words, the method effectively captured the relationship between RGA intensity and gas concentration, providing valuable insights into concentration trends. Thus, our approach serves as a useful tool for estimating gas concentrations and understanding the correlation between RGA intensity and gas composition. Reference[1] B. G. Jeong, S. H. Park, D. H. Goh, and B. J. Lee, Metrology 5 (2025)