Optical bound states in the continuum in subwavelength gratings made of an epitaxial van der Waals material

Data for article "Optical Bound States in the Continuum in Subwavelength Gratings Made of an Epitaxial van der Waals Material" published in ACS Nano.The dataset contains data used for plotting the figures in the paper. The data are results of numerical calculations, measurements and literature research.Fig. 1 Real n and imaginary k part of refractive indices for light at the wavelength of λ = 1100 nm for several materials and numerically calculated minimal height of a subwavelength grating, which can host a bound state in the continuum (BIC), lying on a sapphire substrate as a function of the refractive index n of the grating material for a grating with stripes four times wider than the gaps (fill factor F = 0.8). Files:nreffs_literature_1100nm.dat BIC_hmin_AlO_1e12_F08.txt Fig. 2 Numerically calculated complex values of the wavelength of the antisymmetric mode of the MoSe2 subwavelength grating in the space of the grating period and height for the selected fill factor F = 0.8 and with the experimentally determined net absorption of the MoSe2 layer. File:F08_abs.hdf5Fig. 3 Real and imaginary part of the in-plane (ordinary) and the out-of-plane (extra-ordinary) refractive index of a 42 nm MoSe2 MBE-grown layer determined by ellipsometry measurements as a function of wavelength, unaveraged Raman scattering spectra of “as-grown” MoSe2 layer and AFM images of MoSe2 layer surfaces and subwavelength grating. Files:Opt_Const_of_MoSe2.txtd10_raman_asgrown.h5UW2154_ds_0_00005_fig.spmUW2154_ds_poler_0_00000_fig.spmR0A111_0_00000_fig.spmFig. 4 Angle-resolved maps of reflectivity from the MoSe2-based subwavelength grating for TE (i.e., parallel to the stripes) and TM polarization (i.e., perpendicular to the stripes). Files:Grating_Emi_MoSe2_saph_h0.04_hsaph0.01_L0.5_F0.79_top_kat_D240315.hdf5Figure_4b.datFigure_4d.datFig. 5 Polarization vortex of the antisymmetric mode around the BIC hosted by the MoSe2-based grating in the minimum of its dispersion at λ = 1100 nm. File:TE10_worteks_teo.hdf5Fig. 6 Results of third-harmonic generation measurements. The intensity of THG generated under 27-degree excitation, the wavelength dependence of the enhancement factor at a 27-degree angle, the angular dependence of the maximum observed THG enhancement factor. Files:Fig6a.txtFig6b.txtFig6c.txtFig6d.txtFig. S1 Real and imaginary part of the in-plane (ordinary) and the out-of-plane (extra-ordinary) refractive index of a sapphire substrate determined by ellipsometry measurements as a function of wavelength. File:Opt_Const_of_Al2O3.txt