Synergistic Effects of Ceria Morphology in Magnetically-Assisted Chemical Mechanical Polishing: A Dual-Component Approach for Ultraprecision Surface Planarization

In ultraprecision manufacturing, achieving atomic-level planarization is essential for producing high-end optical components and semiconductor devices. Magnetorheological polishing (MRP) utilizes an external magnetic field to enable high-precision, low-damage, and efficient machining, offering a promising solution. However, the composition of the magnetorheological fluid can still be optimized to balance the material removal rate (MRR) and the surface quality. This study investigates the impact of different ceria morphologies, namely spherical, cubic, and octahedral, on magnetically-assisted chemical mechanical polishing (MCMP) of K9 optical glass, providing a comprehensive analysis of how abrasive morphology influences the MRR, surface roughness, and defect control. The results show that spherical ceria achieved the best surface precision, reducing the surface roughness (Ra) to 0.33 nm without any visible scratches. In contrast, octahedral ceria demonstrated exceptional stability and a high removal rate. These findings provide valuable theoretical insights into the selection and optimization of abrasive morphology in magnetorheological fluids and offer new directions for developing and optimizing technologies aimed at ultraprecision polishing.