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ASML (Netherlands) | Researchclopedia

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ASML (Netherlands)

Veldhoven, North Brabantcompany

2,347

Works

76,012

Citations

83

h-index

Top Research Topics

Advancements in Photolithography Techniques Integrated Circuits and Semiconductor Failure Analysis Electron and X-Ray Spectroscopy Techniques

Top Researchers

Rasmus Nielsen University of Copenhagen

522 works105,835 citationsh-index: 151

Recent Research

Simulating the influence of stoichiometry on the spectral emissivity of <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:mrow> <mml:msub> <mml:mi>Mo</mml:mi> <mml:mi>x</mml:mi> </mml:msub> <mml:msub> <mml:mi>Si</mml:mi> <mml:mi>y</mml:mi> </mml:msub> </mml:mrow> </mml:math> thin films

Zahra Golsanamlou,Arseniy Baskakov,et al.

20260 citations

Advanced Surface Polishing Techniques

Optical Coatings and Gratings

Industrial Vision Systems and Defect Detection

Advanced Measurement and Metrology Techniques

Iterative Learning Control Systems

3D IC and TSV technologies

Semiconductor materials and devices

Nanofabrication and Lithography Techniques

Advanced X-ray Imaging Techniques

Ben W. Mol Royal Women's Hospital

2,252 works80,728 citationsh-index: 131

Fabián Pedregosa Google (Switzerland)

74 works65,971 citationsh-index: 12

Yang Liu University of Leeds

3,458 works61,717 citationsh-index: 106

John M. Maris Children's Hospital of Philadelphia

1,349 works53,396 citationsh-index: 115

Qiang Zhang Zhejiang Sci-Tech University

4,921 works46,906 citationsh-index: 90

JuliaData/CategoricalArrays.jl: v1.1.0

Milan Bouchet-Valat,Alexey Stukalov,et al.

20260 citations

0.55NA EUV contact hole process optimization to enhance depth of focus

Rik Hoefnagels,Jelte van der Valk,et al.

20260 citations

High-power and ultrashort IR-driver platform for industrial coherent XUV metrology

Quentin Mocaer,Antoine Comby,et al.

20260 citations

Dry resist process development toward depth of focus improvement in high NA EUV lithography

Ching-Chung Huang,Ali Haider,et al.

20260 citations

Light-induced damage in semiconductor device manufacturing: Present and future challenges

Ester Abram,Reynolds Dziobek-Garrett,et al.

20260 citations