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Low stress silicon stencil masks for sub-100 nm ion beam lithography | Researchclopedia

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Low stress silicon stencil masks for sub-100 nm ion beam lithography

19905 citationsJournal Article

Authors

F.-O. Fong · University of Houston

D. P. Stumbo · University of Houston

S. Sen · University of Houston

G. A. Damm · University of Houston

D. W. Engler · University of Houston

J. C. Wolfe · University of Houston

John N. Randall · Texas Instruments (United States)

Topics & Keywords

Advancements in Photolithography Techniques Integrated Circuits and Semiconductor Failure Analysis Ion-surface interactions and analysis

Publication Details

Published in: Microelectronic Engineering

Volume 11, Issue 1-4, pp. 449-452

DOI: 10.1016/0167-9317(90)90149-n

Field-Weighted Citation Impact: 2.07

A. R. Shimkunas